Details zur Publikation

Kategorie Textpublikation
Referenztyp Zeitschriften
DOI 10.1007/s11090-010-9282-z
Volltext Shareable Link
Titel (primär) Principal limitations in homogeneous gas phase chemistry in non-thermal plasmas
Autor Holzer, F.; Köhler, R.; Roland, U.; Stelter, E.; Kopinke, F.-D.
Quelle Plasma Chemistry and Plasma Processing
Erscheinungsjahr 2011
Department TUCHEM
Band/Volume 31
Heft 2
Seite von 307
Seite bis 314
Sprache englisch
Keywords Non-thermal plasma; Gas phase oxidation; Radical chain reaction; Hydrogen; Methane
Abstract This study highlights the oxidation of H2, CH4, and HCl present in the range of some volume percent in a homogeneous O2 or air phase in a flow through glass barrier discharge reactor. The oxidation of all three compounds is highly exothermic and exergonic at ambient temperature and proceeds at sufficiently high temperatures as radical chain reaction. The conversion of each compound was below 10% in a non-thermal oxygen plasma under various reaction conditions. Increasing concentrations of H2 and CH4 above the lower explosion limit did not lead to higher conversion degrees. It is assumed that only initial radical formation by electron impact dissociation and exothermic steps within the chain process run in a sufficiently fast manner at ambient temperature. For endothermic steps within the radical chain, the necessary activation energy is not available and the chain reaction aborts, most likely, after formation of peroxyl (hydro- or methyl-peroxyl) radicals.
dauerhafte UFZ-Verlinkung https://www.ufz.de/index.php?en=20939&ufzPublicationIdentifier=10772
Holzer, F., Köhler, R., Roland, U., Stelter, E., Kopinke, F.-D. (2011):
Principal limitations in homogeneous gas phase chemistry in non-thermal plasmas
Plasma Chem. Plasma Process. 31 (2), 307 - 314 10.1007/s11090-010-9282-z